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Biblio-Database.bib
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@article{1987electrical,
title = {Electrical Properties of Lithium-Intercalated {{InSe}}},
year = {1987},
month = mar,
journal = {Materials Letters},
volume = {5},
number = {4},
pages = {134--139},
publisher = {{North-Holland}},
issn = {0167-577X},
doi = {10.1016/0167-577X(87)90021-8},
abstract = {We have studied the intercalation reaction of n-type InSe with n-butyl lithium in hexane solution through the time dependence of the electrical resist\ldots},
langid = {english}
}
@misc{2007physical,
title = {Physical {{Property Measurement System Hardware Manual}}},
year = {2007},
month = jan,
publisher = {{Quantum Design}}
}
@article{2020century,
title = {A Century of Ferroelectricity},
year = {2020},
month = feb,
journal = {Nature Materials},
volume = {19},
number = {2},
pages = {129--129},
publisher = {{Nature Publishing Group}},
issn = {1476-4660},
doi = {10.1038/s41563-020-0611-1},
abstract = {Ferroelectricity was experimentally discovered one hundred years ago, spurring research on its fundamental properties and potential applications.},
copyright = {2020 Springer Nature Limited},
langid = {english},
annotation = {00004}
}
@misc{2020ferroelectricity,
title = {Ferroelectricity: 100 Years On},
shorttitle = {Ferroelectricity},
year = {2020},
month = nov,
journal = {Physics World},
abstract = {Amar S Bhalla and Avadh Saxena pick out their favourite applications of ferroelectricity 100 years on since its discovery},
howpublished = {https://physicsworld.com/a/ferroelectricity-100-years-on/},
langid = {british},
annotation = {00000}
}
@article{algarni2016absorption,
title = {Absorption and Optical Conduction in {{InSe}}/{{ZnSe}}/{{InSe}} Thin Film Transistors},
author = {Al Garni, S. E. and Qasrawi, A. F.},
year = {2016},
month = apr,
journal = {Functional Materials Letters},
volume = {09},
number = {02},
pages = {1650019},
publisher = {{World Scientific Publishing Co.}},
issn = {1793-6047},
doi = {10.1142/S1793604716500193},
abstract = {In this work, (n)InSe/(p)ZnSe and (n)InSe/(p)ZnSe/(n)InSe heterojunction thin film transistor (TFT) devices are produced by the thermal evaporation technique. They are characterized by means of X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersion X-ray spectroscopy and optical spectroscopy techniques. While the InSe films are found to be amorphous, the ZnSe and InSe/ZnSe films exhibited polycrystalline nature of crystallization. The optical analysis has shown that these devices exhibit a conduction band offsets of 0.47 and valence band offsets of 0.67 and 0.74 eV, respectively. In addition, while the dielectric spectra of the InSe and ZnSe displayed resonance peaks at 416 and 528 THz, the dielectric spectra of InSe/ZnSe and InSe/ZnSe/InSe layers indicated two additional peaks at 305 and 350 THz, respectively. On the other hand, the optical conductivity analysis and modeling in the light of free carrier absorption theory reflected low values of drift mobilities associated with incident alternating electric fields at terahertz frequencies. The drift mobility of the charge carrier particles at femtoseconds scattering times increased as a result of the ZnSe sandwiching between two InSe layers. The valence band offsets, the dielectric resonance at 305 and 350 THz and the optical conductivity values nominate TFT devices for use in optoelectronics.},
keywords = {Band gap,effective mass,Heterojunction,InSe,mobility optical,photo-transport,Resistivity/conductivity,SEM,thin film transistor,XRD}
}
@article{ali2020study,
title = {A {{Study}} on the {{Temperature-Dependent Operation}} of {{Fluorite-Structure-Based Ferroelectric HfO}}{\textsubscript{2}} {{Memory FeFET}}: {{Pyroelectricity}} and {{Reliability}}},
shorttitle = {A {{Study}} on the {{Temperature-Dependent Operation}} of {{Fluorite-Structure-Based Ferroelectric HfO2 Memory FeFET}}},
author = {Ali, T. and K{\"u}hnel, K. and Czernohorsky, M. and Mart, C. and Rudolph, M. and P{\"a}tzold, B. and Lehninger, D. and Olivo, R. and Lederer, M. and M{\"u}ller, F. and Hoffmann, R. and Metzger, J. and Binder, R. and Steinke, P. and K{\"a}mpfe, T. and M{\"u}ller, J. and Seidel, K. and Eng, L. M.},
year = {2020},
month = jul,
journal = {IEEE Transactions on Electron Devices},
volume = {67},
number = {7},
pages = {2981--2987},
issn = {1557-9646},
doi = {10.1109/TED.2020.2995781},
abstract = {We report on the high-temperature operation and reliability of the Si-doped hafnium oxide (HSO) ferroelectric FET (FeFET) emerging memory. In this study, we explore the role of high-temperature operation of the ferroelectric (FE) material on the FeFET in the temperature range of 40-120 \textdegree C. The inverse memory window (MW) dependence on temperature leads to a very small MW size ( 300 mV) at 120 \textdegree C. The recovery of MW size at room temperature (RT) indicates a potential pyroelectric effect as a cause for MW closure upon high-temperature operation. The FeFET state readout shows pronounced effects to erase (ER) threshold voltage (Vth) shift, due to the decrease in remnant polarization and improved substrate Vth shift as the temperature increases. The endurance reliability measured for temperature range (-40 \textdegree C to 40 \textdegree C) with 105 cycles shows a maximized initial MW at low temperatures, whereas higher postcycling interface trap generation occurs as the temperature increases. The FeFET 10 h retention tests at 0 \textdegree C and 40 \textdegree C were extrapolated to ten years and indicated stable properties independent of temperature. The depolarization field (Ed) dependence on the FeFET stack parameters is studied based on an analytical formula. The Ed decreases with increased permittivity of the FE, interface layer (IL), and increased FE film thickness. Substrate doping and temperature seem to have a small impact on Ed, whereas the FE-IL area ratio tuning below unity lowers the Ed. The role of pyroelectric effect on the FeFET memory and operating temperature-induced endurance and retention reliability concerns are discussed.},
keywords = {Depolarization field,endurance,FeFET,ferroelectric (FE),Iron,metal-ferroelectric-insulator-semiconductor (MFIS),Reliability,retention,temperature dependence,Temperature dependence,Temperature distribution,Temperature measurement}
}
@article{almeida2017colloidal,
title = {Colloidal {{Monolayer}} {$\beta$}-{{In}}{\textsubscript{2}}{{Se}}{\textsubscript{3}} {{Nanosheets}} with {{High Photoresponsivity}}},
author = {Almeida, Guilherme and Dogan, Sedat and Bertoni, Giovanni and Giannini, Cinzia and Gaspari, Roberto and Perissinotto, Stefano and Krahne, Roman and Ghosh, Sandeep and Manna, Liberato},
year = {2017},
month = mar,
journal = {Journal of the American Chemical Society},
volume = {139},
number = {8},
pages = {3005--3011},
publisher = {{American Chemical Society}},
issn = {0002-7863},
doi = {10.1021/jacs.6b11255},
abstract = {We report a low-temperature colloidal synthesis of single-layer, five-atom-thick, {$\beta$}-In2Se3 nanosheets with lateral sizes tunable from {$\sim$}300 to {$\sim$}900 nm, using short aminonitriles (dicyandiamide or cyanamide) as shape controlling agents. The phase and the monolayer nature of the nanosheets were ascertained by analyzing the intensity ratio between two diffraction peaks from two-dimensional slabs of the various phases, determined by diffraction simulations. These findings were further backed-up by comparing and fitting the experimental X-ray diffraction pattern with Debye formula simulated patterns and with side-view high-resolution transmission electron microscopy imaging and simulation. The {$\beta$}-In2Se3 nanosheets were found to be indirect band gap semiconductors (Eg = 1.55 eV), and single nanosheet photodetectors demonstrated high photoresponsivity and fast response times.},
keywords = {In2Se3 β (1T)}
}
@article{altshuler1999theory,
title = {Theory of {{Metal-Insulator Transitions}} in {{Gated Semiconductors}}},
author = {Altshuler, Boris L. and Maslov, Dmitrii L.},
year = {1999},
month = jan,
journal = {Physical Review Letters},
volume = {82},
number = {1},
pages = {145--148},
publisher = {{American Physical Society}},
doi = {10.1103/PhysRevLett.82.145},
abstract = {It is shown that recent experiments indicating a metal-insulator transition in 2D electron systems can be interpreted in terms of a simple model, in which the resistivity is controlled by scattering at charged hole traps located in the oxide layer. The gate voltage changes the number of charged traps which results in a sharp change in the resistivity. The observed exponential temperature dependence of the resistivity in the metallic phase of the transition follows from the temperature dependence of the trap occupation number. The model naturally describes the experimentally observed scaling properties of the transition and the effects of magnetic and electric fields.}
}
@article{amaricci2010extended,
title = {Extended {{Hubbard}} Model: {{Charge}} Ordering and {{Wigner-Mott}} Transition},
shorttitle = {Extended {{Hubbard}} Model},
author = {Amaricci, A. and Camjayi, A. and Haule, K. and Kotliar, G. and Tanaskovi{\'c}, D. and Dobrosavljevi{\'c}, V.},
year = {2010},
month = oct,
journal = {Physical Review B},
volume = {82},
number = {15},
pages = {155102},
publisher = {{American Physical Society}},
doi = {10.1103/PhysRevB.82.155102},
abstract = {Strong correlations effects, which are often associated to the approach to a Mott insulating state, in some cases may be observed even far from half filling. This typically happens whenever the intersite Coulomb repulsion induces a tendency toward charge ordering, an effect that confines the electrons, and in turn favors local moment formation, i.e., Mott localization. A distinct intermediate regime then emerges as a precursor of such a Wigner-Mott transition, which is characterized by both charge and spin correlations, displaying large mass enhancements and strong renormalizations of other Fermi-liquid parameters. Here we present a careful study of a quarter-filled extended Hubbard model\textemdash a simple example where such physics can be studied in detail, and discuss its relevance for the understanding of the phenomenology of low-density two-dimensional electron gases.}
}
@article{amory2003study,
title = {Study of a Growth Instability of {$\gamma$}-{{In}}{\textsubscript{2}}{{Se}}{\textsubscript{3}}},
author = {Amory, C. and Bern{\`e}de, J. C. and Marsillac, S.},
year = {2003},
month = nov,
journal = {Journal of Applied Physics},
volume = {94},
number = {10},
pages = {6945--6948},
publisher = {{American Institute of Physics}},
issn = {0021-8979},
doi = {10.1063/1.1622117},
keywords = {In2Se3 κ}
}
@article{anderson1958absence,
title = {Absence of {{Diffusion}} in {{Certain Random Lattices}}},
author = {Anderson, P. W.},
year = {1958},
month = mar,
journal = {Physical Review},
volume = {109},
number = {5},
pages = {1492--1505},
publisher = {{American Physical Society}},
doi = {10.1103/PhysRev.109.1492},
abstract = {This paper presents a simple model for such processes as spin diffusion or conduction in the "impurity band." These processes involve transport in a lattice which is in some sense random, and in them diffusion is expected to take place via quantum jumps between localized sites. In this simple model the essential randomness is introduced by requiring the energy to vary randomly from site to site. It is shown that at low enough densities no diffusion at all can take place, and the criteria for transport to occur are given.}
}
@article{anderson1965symmetry,
title = {Symmetry {{Considerations}} on {{Martensitic Transformations}}: "{{Ferroelectric}}" {{Metals}}?},
shorttitle = {Symmetry {{Considerations}} on {{Martensitic Transformations}}},
author = {Anderson, P. W. and Blount, E. I.},
year = {1965},
month = feb,
journal = {Physical Review Letters},
volume = {14},
number = {7},
pages = {217--219},
doi = {10.1103/physrevlett.14.217},
abstract = {DOI:https://doi.org/10.1103/PhysRevLett.14.217},
annotation = {00385}
}
@article{apostol2015band,
title = {Band {{Bending}} at {{Metal-Semiconductor Interfaces}}, {{Ferroelectric Surfaces}} and {{Metal-Ferroelectric Interfaces Investigated}} by {{Photoelectron Spectroscopy}}},
author = {Apostol, Nicoleta Georgiana and Teodorescu, Cristian-Mihail},
year = {2015},
journal = {Surface Science Tools for Nanomaterials Characterization},
pages = {405--461},
publisher = {{Springer, Berlin, Heidelberg}},
doi = {10.1007/978-3-662-44551-8_11},
abstract = {X-ray photoelectron spectroscopy is nowadays a well-established technique for the determination of chemical compounds with surface sensitivity. To the atomic and chemical specificity and surface...},
langid = {english}
}
@article{arora2021recent,
title = {Recent Progress in Contact, Mobility, and Encapsulation Engineering of {{InSe}} and {{GaSe}}},
author = {Arora, Himani and Erbe, Artur},
year = {2021},
journal = {InfoMat},
volume = {3},
number = {6},
pages = {662--693},
issn = {2567-3165},
doi = {10.1002/inf2.12160},
abstract = {The field of two-dimensional (2D) materials has stimulated considerable interest in the scientific community. Owing to quantum confinement in one direction, intriguing properties have been reported in 2D materials that cannot be observed in their bulk form. The advent of semiconducting 2D materials with a broad range of electronic properties has provided fascinating opportunities to design and configure next-generation electronics. One such emerging class is the family of III-VI monochalcogenides, the two prominent members of which are indium selenide (InSe) and gallium selenide (GaSe). In contrast to transition metal dichalcogenides, their high intrinsic mobility and the availability of a direct bandgap at small thicknesses have attracted researchers to investigate the underlying physical phenomena as well as their technological applications. However, the sensitivity of InSe and GaSe to environmental influences has limited their exploitation in functional devices. The lack of methods for their scalable synthesis further hinders the realization of their devices. This review article outlines recent advancements in the synthesis and understanding of the charge transport properties of InSe and GaSe for their integration into technological applications. A detailed summary of the improvements in the device structure by optimizing extrinsic factors such as bottom substrates, metal contacts, and device fabrication schemes is provided. Furthermore, various encapsulation techniques that have been proven effective in preventing the degradation of InSe and GaSe layers under ambient conditions are thoroughly discussed. Finally, this article presents an outlook on future research ventures with respect to ongoing developments and practical viability of these materials.},
langid = {english},
keywords = {device,InSe,mobility,Raman,review article}
}
@article{aspect2009anderson,
title = {Anderson Localization of Ultracold Atoms},
author = {Aspect, Alain and Inguscio, Massimo},
year = {2009},
month = aug,
journal = {Physics Today},
volume = {62},
number = {8},
pages = {30--35},
publisher = {{American Institute of Physics}},
issn = {0031-9228},
doi = {10.1063/1.3206092}
}
@article{azadmanjiri2018graphenesupported,
title = {Graphene-Supported {{2D}} Transition Metal Oxide Heterostructures},
author = {Azadmanjiri, Jalal and Srivastava, Vijay K. and Kumar, Parshant and Wang, James and Yu, Aimin},
year = {2018},
month = jul,
journal = {Journal of Materials Chemistry A},
volume = {6},
number = {28},
pages = {13509--13537},
publisher = {{The Royal Society of Chemistry}},
issn = {2050-7496},
doi = {10.1039/C8TA03404D},
abstract = {Heterostructures of two-dimensional (2D) nanomaterials such as graphene/transition metal oxide (TMO) have recently attracted great interest due to their unique structures and superior properties that none of the individual conventional 2D nanomaterials could have. These unusual properties are due to alteration of the Fermi energy position, density of states, and work function of those heterostructures rather than their chemical components. The physical and quantum properties, the interfacial layer and the synergistic effect of each component in 2D heterostructures lead to the generation of new behavior and properties. In this review article, we are focusing on the recent progress in studying the characteristics and properties of 2D graphene/TMO heterostructures, and their significant applications in advanced energy storage and conversion devices. In this context, we firstly introduce bottom-up wet chemical approaches for the synthesis of 2D graphene/TMO heterostructures. The electron transfer, bonding chemistry and defects at the interface of these heterostructures are then discussed. Thirdly, the tunable properties of 2D graphene/TMO heterostructures and their applications in advanced energy storage and conversion devices are presented. The final section discusses the challenges and future prospects of 2D graphene/TMO heterostructures.},
langid = {english}
}
@book{bain2017ferroelectrics,
title = {Ferroelectrics: {{Principles}} and {{Applications}}},
shorttitle = {Ferroelectrics},
author = {Bain, Ashim Kumar and Chand, Prem},
year = {2017},
month = jan,
edition = {1 edition},
publisher = {{Wiley-VCH}},
abstract = {Combining both fundamental principles and real-life applications in a single volume, this book discusses the latest research results in ferroelectrics, including many new ferroelectric materials for the latest technologies, such as capacitors, transducers and memories. The first two chapters introduce dielectrics and microscopic materials properties, while the following chapter discusses pyroelectricity and piezoelectricity. The larger part of the text is devoted to ferroelectricity and ferroelectric ceramics, with not only their fundamentals but also applications discussed. The book concludes with a look at the future for laser printed materials and applications. With over 600 references to recent publications on piezoelectric and ferroelectric materials, this is an invaluable reference for physicists, materials scientists and engineers.},
isbn = {978-3-527-34214-3},
langid = {english},
annotation = {00000 ZSCC: 0000025}
}
@article{balakrishnan2016quantum,
title = {Quantum Confinement and Photoresponsivity of {$\beta$}-{{In}}{\textsubscript{2}}{{Se}}{\textsubscript{3}} Nanosheets Grown by Physical Vapour Transport},
author = {Balakrishnan, Nilanthy and Staddon, Christopher R. and Smith, Emily F. and Stec, Jakub and Gay, Dean and Mudd, Garry W. and {Oleg Makarovsky} and Kudrynskyi, Zakhar R. and Kovalyuk, Zakhar D. and Eaves, Laurence and Patan{\`e}, Amalia and Beton, Peter H.},
year = {2016},
journal = {2D Materials},
volume = {3},
number = {2},
pages = {025030},
issn = {2053-1583},
doi = {10.1088/2053-1583/3/2/025030},
abstract = {We demonstrate that {$\beta$} -In 2 Se 3 layers with thickness ranging from 2.8 to 100 nm can be grown on SiO 2 /Si, mica and graphite using a physical vapour transport method. The {$\beta$} -In 2 Se 3 layers are chemically stable at room temperature and exhibit a blue-shift of the photoluminescence emission when the layer thickness is reduced, due to strong quantum confinement of carriers by the physical boundaries of the material. The layers are characterised using Raman spectroscopy and x-ray diffraction from which we confirm lattice constants c = 28.31 {$\pm$} 0.05 \AA{} and a = 3.99 {$\pm$} 0.02 \AA. In addition, these layers show high photoresponsivity of up to {$\sim$}2 \texttimes{} 10 3 A W -1 at {$\lambda$} = 633 nm, with rise and decay times of {$\tau$} r = 0.6 ms and {$\tau$} d = 2.5 ms, respectively, confirming the potential of the as-grown layers for high sensitivity photodetectors.},
langid = {english},
keywords = {AFM,device,In2Se3 α,In2Se3 β,photo-transport,photoluminescence,Raman,XPS,XRD},
annotation = {00000}
}
@article{balakrishnan2018epitaxial,
title = {Epitaxial Growth of {$\gamma$}-{{InSe}} and {$\alpha$}, {$\beta$}, and {$\gamma$}-{{In}}{\textsubscript{2}}{{Se}}{\textsubscript{3}} on {$\epsilon$}-{{GaSe}}},
author = {Balakrishnan, Nilanthy and Steer, Elisabeth D. and Smith, Emily F. and Kudrynskyi, Zakhar R. and Kovalyuk, Zakhar D. and Eaves, Laurence and Patan{\`e}, Amalia and Beton, Peter H.},
year = {2018},
month = jun,
journal = {2D Materials},
volume = {5},
number = {3},
pages = {035026},
issn = {2053-1583},
doi = {10.1088/2053-1583/aac479},
abstract = {We demonstrate that {$\gamma$}-InSe and the {$\alpha$}, {$\beta$} and {$\gamma$} phases of In2Se3 can be grown epitaxially on {$\epsilon$}-GaSe substrates using a physical vapour transport method. By exploiting the temperature gradient within the tube furnace, we can grow selectively different phases of InxSey depending on the position of the substrate within the furnace. The uniform cleaved surface of {$\epsilon$}-GaSe enables the epitaxial growth of the InxSey layers, which are aligned over large areas. The InxSey epilayers are characterised using Raman, photoluminescence, x-ray photoelectron and electron dispersive x-ray spectroscopies. Each InxSey phase and stoichiometry exhibits distinct optical and vibrational properties, providing a tuneable photoluminescence emission range from 1.3 eV to 2 eV suitable for exploitation in electronics and optoelectronics.},
langid = {english},
keywords = {Band gap,film,In2Se3 α (3R),In2Se3 β,In2Se3 γ,InSe γ (3R),photoluminescence,Raman},
annotation = {ZSCC: 0000016}
}
@article{balke2015differentiating,
title = {Differentiating {{Ferroelectric}} and {{Nonferroelectric Electromechanical Effects}} with {{Scanning Probe Microscopy}}},
author = {Balke, Nina and Maksymovych, Petro and Jesse, Stephen and Herklotz, Andreas and Tselev, Alexander and Eom, Chang-Beom and Kravchenko, Ivan I. and Yu, Pu and Kalinin, Sergei V.},
year = {2015},
month = jun,
journal = {ACS Nano},
volume = {9},
number = {6},
pages = {6484--6492},
publisher = {{American Chemical Society}},
issn = {1936-0851},
doi = {10.1021/acsnano.5b02227},
abstract = {Ferroelectricity in functional materials remains one of the most fascinating areas of modern science in the past several decades. In the last several years, the rapid development of piezoresponse force microscopy (PFM) and spectroscopy revealed the presence of electromechanical hysteresis loops and bias-induced remnant polar states in a broad variety of materials including many inorganic oxides, polymers, and biosystems. In many cases, this behavior was interpreted as the ample evidence for ferroelectric nature of the system. Here, we systematically analyze PFM responses on ferroelectric and nonferroelectric materials and demonstrate that mechanisms unrelated to ferroelectricity can induce ferroelectric-like characteristics through charge injection and electrostatic forces on the tip. We will focus on similarities and differences in various PFM measurement characteristics to provide an experimental guideline to differentiate between ferroelectric material properties and charge injection. In the end, we apply the developed measurement protocols to an unknown ferroelectric material.},
annotation = {00182}
}
@article{bandurin2017high,
title = {High Electron Mobility, Quantum {{Hall}} Effect and Anomalous Optical Response in Atomically Thin {{InSe}}},
author = {Bandurin, Denis A. and Tyurnina, Anastasia V. and Yu, Geliang L. and Mishchenko, Artem and Z{\'o}lyomi, Viktor and Morozov, Sergey V. and Kumar, Roshan Krishna and Gorbachev, Roman V. and Kudrynskyi, Zakhar R. and Pezzini, Sergio and Kovalyuk, Zakhar D. and Zeitler, Uli and Novoselov, Konstantin S. and Patan{\`e}, Amalia and Eaves, Laurence and Grigorieva, Irina V. and Fal'ko, Vladimir I. and Geim, Andre K. and Cao, Yang},
year = {2017},
month = mar,
journal = {Nature Nanotechnology},
volume = {12},
number = {3},
pages = {223--227},
publisher = {{Nature Publishing Group}},
issn = {1748-3395},
doi = {10.1038/nnano.2016.242},
abstract = {Encapsulated few-layer InSe exhibits a remarkably high electronic quality, which is promising for the development of ultrathin-body high-mobility nanoelectronics.},
copyright = {2016 Nature Publishing Group},
langid = {english},
keywords = {Carrier density,device,FET,flake,hBN,Heterostructure,InSe γ (3R),magnetoconductance,mobility,monolayer,photoluminescence,Resistivity/conductivity,Resistivity/conductivity-temperature},
annotation = {ZSCC: 0000000[s0]}
}
@article{baranovskii2014theoretical,
title = {Theoretical Description of Charge Transport in Disordered Organic Semiconductors},
author = {Baranovskii, S. D.},
year = {2014},
month = mar,
journal = {physica status solidi (b)},
volume = {251},
number = {3},
pages = {487--525},
publisher = {{John Wiley \& Sons, Ltd}},
issn = {0370-1972},
doi = {10.1002/pssb.201350339},
abstract = {Twenty years ago Heinz B\"assler published in this journal the seminal review article on charge transport in disordered organic semiconductors [Phys. Status Solidi B 175, 15 (1993)], which has become one of the most popular references in this research field. Thanks to this paper, our understanding of charge transport in disordered organic materials has been essentially improved in the past two decades. New theoretical methods have been developed and new results on various phenomena related to charge transport in disordered organic materials have been obtained. The aim of the current review is to present these new theoretical methods and to highlight the most essential results obtained in their framework. While theoretical consideration in the article by B\"assler was based on computer simulations, particular attention in the current review is given to the development of analytical theories. Dependences of charge carrier mobility and diffusivity on temperature, electric field, carrier concentration and on material and sample parameters are discussed in detail. Schematic behaviour of charge carriers within the Gaussian density of states (DOS)},
keywords = {charge transport,disorder,hopping conduction,organic semiconductors}
}
@article{barbosa2019studying,
title = {Studying Electronic Properties in {{GaN}} without Electrical Contacts Using {$\gamma$}-{$\gamma$} vs E--{$\gamma$} {{Perturbed Angular Correlations}}},
author = {Barbosa, M. B. and Correia, J. G. and Lorenz, K. and Vianden, R. and Ara{\'u}jo, J. P.},
year = {2019},
month = oct,
journal = {Scientific Reports},
volume = {9},
number = {1},
pages = {15734},
publisher = {{Nature Publishing Group}},
issn = {2045-2322},
doi = {10.1038/s41598-019-52098-5},
abstract = {The potential use of combined e--{$\gamma$} vs {$\gamma$}-{$\gamma$} Perturbed Angular Correlations (PAC) experiments as a possible alternative to study electronic properties of materials and/or samples where Hall effect measurements are difficult to perform due to low-quality ohmic contacts is here demonstrated using Si- and Zn-doped GaN samples as a showcase example. To do so, the lattice site of implanted 181Hf/181Ta and the recombination of Ta ionized and excited electronic states were studied as a function of temperature and sample doping in GaN. By combining the {$\gamma$}-{$\gamma$} and e--{$\gamma$} PAC results with Density Functional Theory simulations, it was possible to assign a single stable site with a double-donor character for Ta in GaN. A metastable charge state was also identified at particular temperatures using e--{$\gamma$} PAC. A thermally activated process was observed for the electronic recombination at high temperatures with activation energies of 15(2) meV and 12(1) meV for the Si- and Zn-doped samples, respectively, and attributed to Si shallow donors present in both samples. A reduced number of available electrons was observed in the Zn-doped sample due to donor compensation by the Zn acceptors. At low temperatures, it is suggested that the recombination process occurs via Variable Range Hopping. The doping characteristics of both samples were successfully distinguished.},
copyright = {2019 The Author(s)},
langid = {english},
annotation = {Bandiera\_abtest: a Cc\_license\_type: cc\_by Cg\_type: Nature Research Journals Primary\_atype: Research Subject\_term: Characterization and analytical techniques;Semiconductors Subject\_term\_id: characterization-and-analytical-techniques;semiconductors}
}
@article{bartlett2013nonaqueous,
title = {Non-Aqueous Electrodeposition of p-Block Metals and Metalloids from Halometallate Salts},
author = {Bartlett, Philip N. and Cook, David and de Groot, C. H. (Kees) and Hector, Andrew L. and Huang, Ruomeng and Jolleys, Andrew and Kissling, Gabriela P. and Levason, William and Pearce, Stuart J. and Reid, Gillian},
year = {2013},
month = aug,
journal = {RSC Advances},
volume = {3},
number = {36},
pages = {15645--15654},
publisher = {{The Royal Society of Chemistry}},
issn = {2046-2069},
doi = {10.1039/C3RA40739J},
abstract = {A versatile electrochemical system for the non-aqueous electrodeposition of crystalline, oxide free p-block metals and metalloids is described, and it is demonstrated that by combining mixtures of these reagents, this system is suitable for electrodeposition of binary semiconductor alloys. The tetrabutylammonium halometallates, [NnBu4][InCl4], [NnBu4][SbCl4], [NnBu4][BiCl4], [NnBu4]2[SeCl6] and [NnBu4]2[TeCl6], are readily dissolved in CH2Cl2 and form reproducible electrochemical systems with good stability in the presence of a [NnBu4]Cl supporting electrolyte. The prepared electrolytes show a wide potential window and the electrodeposition of indium, antimony, bismuth, tellurium and selenium on glassy carbon and titanium nitride electrodes has been demonstrated. The deposited elements were characterised by scanning electron microscopy, energy dispersive X-ray analysis and powder X-ray diffraction. The compatibility of the reagents permits the preparation of a single electrolyte containing several halometallate species which allows the electrodeposition of binary materials, as is demonstrated for InSb. This room temperature, `bottom-up' electrochemical approach should thus be suitable for the one-pot deposition of a wide range of compound semiconductor materials.},
langid = {english}
}
@article{bartolomeo2017hysteresis,
title = {Hysteresis in the Transfer Characteristics of {{MoS}}{\textsubscript{2}} Transistors},
author = {Bartolomeo, Antonio Di and Genovese, Luca and Giubileo, Filippo and Iemmo, Laura and Luongo, Giuseppe and Foller, Tobias and Schleberger, Marika},
year = {2017},
month = oct,
journal = {2D Materials},
volume = {5},
number = {1},
pages = {015014},
publisher = {{IOP Publishing}},
issn = {2053-1583},
doi = {10.1088/2053-1583/aa91a7},
langid = {english}
}
@article{beckers2018cryogenic,
title = {Cryogenic {{MOS Transistor Model}}},
author = {Beckers, Arnout and Jazaeri, Farzan and Enz, Christian},
year = {2018},
month = sep,
journal = {IEEE Transactions on Electron Devices},
volume = {65},
number = {9},
pages = {3617--3625},
issn = {1557-9646},
doi = {10.1109/TED.2018.2854701},
abstract = {This paper presents a physics-based analytical model for the MOS transistor operating continuously from room temperature down to liquid-helium temperature (4.2 K) from depletion to strong inversion and in the linear and saturation regimes. The model is developed relying on the 1-D Poisson equation and the drift-diffusion transport mechanism. The validity of the Maxwell-Boltzmann approximation is demonstrated in the limit to 0 K as a result of dopant freezeout in cryogenic equilibrium. Explicit MOS transistor expressions are then derived, including incomplete dopant ionization, bandgap widening, mobility reduction, and interface charge traps. The temperature dependence of the interface trapping process explains the discrepancy between the measured value of the subthreshold swing and the thermal limit at deep-cryogenic temperatures. The accuracy of the developed model is validated by experimental results on long devices of a commercial 28-nm bulk CMOS process. The proposed model provides the core expressions for the development of physically accurate compact models dedicated to low-temperature CMOS circuit simulation.},
keywords = {Computational modeling,Cryo-CMOS,cryogenic MOSFET,Cryogenics,freezeout,incomplete ionization,Integrated circuit modeling,interface traps,Ionization,low temperature,Mathematical model,MOS transistor,MOSFET,physical modeling}
}
@article{beckers2020physical,
title = {Physical {{Model}} of {{Low-Temperature}} to {{Cryogenic Threshold Voltage}} in {{MOSFETs}}},
author = {Beckers, Arnout and Jazaeri, Farzan and Grill, Alexander and Narasimhamoorthy, Subramanian and Parvais, Bertrand and Enz, Christian},
year = {2020},
journal = {IEEE Journal of the Electron Devices Society},
volume = {8},
pages = {780--788},
issn = {2168-6734},
doi = {10.1109/JEDS.2020.2989629},
abstract = {This article presents a physical model of the threshold voltage in MOSFETs valid down to 4.2 K. Interface traps close to the band edge modify the saturating temperature behavior of the threshold voltage observed in cryogenic measurements. Dopant freezeout, bandgap widening, and uniformly distributed traps in the bandgap do not change the qualitative behavior of the threshold voltage over temperature. Care should be taken because dopant freezeout results in a different physical definition of the threshold voltage. Using different definitions changes significantly the threshold current level. The proposed model is experimentally validated with measurements in large-area nMOS and pMOS devices of a commercial 28-nm bulk CMOS process down to 4.2 K. Our modeling results suggest that a pMOS-specific phenomenon in the gate stack is responsible for the non-saturating temperature behavior of the threshold voltage in pMOS devices.},
keywords = {28-nm bulk CMOS,cryo-CMOS,cryogenic,Cryogenics,freezeout,incomplete ionization,interface traps,Ionization,MOSFET,Temperature dependence,threshold voltage,Threshold voltage}
}
@article{beckers2020theoretical,
title = {Theoretical {{Limit}} of {{Low Temperature Subthreshold Swing}} in {{Field-Effect Transistors}}},
author = {Beckers, Arnout and Jazaeri, Farzan and Enz, Christian},
year = {2020},
month = feb,
journal = {IEEE Electron Device Letters},
volume = {41},
number = {2},
pages = {276--279},
issn = {1558-0563},
doi = {10.1109/LED.2019.2963379},
abstract = {This letter reports a temperature-dependent limit for the subthreshold swing in MOSFETs that deviates from the Boltzmann limit at deep-cryogenic temperatures. Below a critical temperature, the derived limit saturates to a value that is independent of temperature and proportional to the characteristic decay of a band tail. The proposed expression tends to the Boltzmann limit when the decay of the band tail tends to zero. Since the saturation is universally observed in different types of MOSFETs (regardless of dimension or semiconductor material), this suggests that an intrinsic mechanism is responsible for the band tail.},
keywords = {Band tail,cryogenic,Logic gates,modeling,MOSFET,Photonic band gap,Silicon,subthreshold slope,subthreshold swing,Temperature,Temperature dependence,Temperature measurement}
}
@article{benedek2016ferroelectric,
title = {`{{Ferroelectric}}' Metals Reexamined: Fundamental Mechanisms and Design Considerations for New Materials},
shorttitle = {`{{Ferroelectric}}' Metals Reexamined},
author = {Benedek, Nicole A. and Birol, Turan},
year = {2016},
month = may,
journal = {Journal of Materials Chemistry C},
volume = {4},
number = {18},
pages = {4000--4015},
issn = {2050-7534},
doi = {10.1039/c5tc03856a},
abstract = {The recent observation of a ferroelectric-like structural transition in metallic LiOsO3 has generated a flurry of interest in the properties of polar metals. Such materials are thought to be rare because free electrons screen out the long-range electrostatic forces that favor a polar structure with a dipole moment in every unit cell. In this work, we question whether long-range electrostatic forces are always the most important ingredient in driving polar distortions. We use crystal chemical models, in combination with first-principles Density Functional Theory calculations, to explore the mechanisms of inversion-symmetry breaking in LiOsO3 and both insulating and electron-doped ATiO3 perovskites, A = Ba, Sr, Ca. Although electrostatic forces do play a significant role in driving the polar instability of BaTiO3 (which is suppressed under electron doping), the polar phases of CaTiO3 and LiOsO3 emerge through a mechanism driven by local bonding preferences and this mechanism is `resistant' to the presence of charge carriers. Hence, our results suggest that there is no fundamental incompatibility between metallicity and polar distortions. We use the insights gained from our calculations to suggest design principles for new polar metals and promising avenues for further research.},
langid = {english},
annotation = {00061}
}
@article{bergeron2021polymorphism,
title = {Polymorphism in {{Post-Dichalcogenide Two-Dimensional Materials}}},
author = {Bergeron, Hadallia and Lebedev, Dmitry and Hersam, Mark C.},
year = {2021},
month = feb,
journal = {Chemical Reviews},
volume = {121},
number = {4},
pages = {2713--2775},
publisher = {{American Chemical Society}},
issn = {0009-2665},
doi = {10.1021/acs.chemrev.0c00933},
abstract = {Two-dimensional (2D) materials exhibit a wide range of atomic structures, compositions, and associated versatility of properties. Furthermore, for a given composition, a variety of different crystal structures (i.e., polymorphs) can be observed. Polymorphism in 2D materials presents a fertile landscape for designing novel architectures and imparting new functionalities. The objective of this Review is to identify the polymorphs of emerging 2D materials, describe their polymorph-dependent properties, and outline methods used for polymorph control. Since traditional 2D materials (e.g., graphene, hexagonal boron nitride, and transition metal dichalcogenides) have already been studied extensively, the focus here is on polymorphism in post-dichalcogenide 2D materials including group III, IV, and V elemental 2D materials, layered group III, IV, and V metal chalcogenides, and 2D transition metal halides. In addition to providing a comprehensive survey of recent experimental and theoretical literature, this Review identifies the most promising opportunities for future research including how 2D polymorph engineering can provide a pathway to materials by design.},
keywords = {In2Se3 α (2H),In2Se3 α (3R),In2Se3 β (1T),In2Se3 β (2H),In2Se3 β (3R),In2Se3 β',review article}
}
@article{bergmann2010weak,
title = {Weak Localization and Its Applications as an Experimental Tool},
author = {Bergmann, Gerd},
year = {2010},
month = may,
journal = {International Journal of Modern Physics B},
volume = {24},
number = {12n13},
pages = {2015--2052},
publisher = {{World Scientific Publishing Co.}},
issn = {0217-9792},
doi = {10.1142/S021797921006468X},
abstract = {The resistance of two-dimensional electron systems such as thin disordered films shows deviations from Boltzmann theory, which are caused by quantum corrections and are called weak localization. The theoretical origin of weak localization is the Langer\textendash Neal graph in Kubo formalism. It represents an interference experiment with conduction electrons split into pairs of waves interfering in the back-scattering direction. The intensity of the interference (integrated over the time) can easily be measured by the resistance of the film. The application of a magnetic field B destroys the phase coherence after a time which is proportional to 1/B. For a field of 1 T this time is of the order of 1 ps. Therefore with a dc experiment, one can measure characteristic times of the electron system in the range of picoseconds. Weak localization has been applied to measure dephasing, spin-orbit scattering, tunneling times, etc. One important field of application is the investigation of magnetic systems and magnetic impurities by measuring the magnetic dephasing time and its temperature dependence. Here the Kondo maximum of spin-flip scattering, spin-fluctuations, Fermi liquid behavior and magnetic d-resonances have been investigated. Another field is the detection of magnetic moments for very dilute alloys and surface impurities. This article given a brief survey of different applications of weak localization with a focus on magnetic impurities.}
}
@article{blom1994ferroelectric,
title = {Ferroelectric {{Schottky Diode}}},
author = {Blom, P. W. M. and Wolf, R. M. and Cillessen, J. F. M. and Krijn, M. P. C. M.},
year = {1994},
month = oct,
journal = {Physical Review Letters},
volume = {73},
number = {15},
pages = {2107--2110},
publisher = {{American Physical Society}},
doi = {10.1103/PhysRevLett.73.2107},
abstract = {A Schottky contact consisting of a semiconducting ferroelectric material and a high work function metal shows a bistable conduction characteristic. An on/off ratio of about 2 orders of magnitude was obtained in a structure consisting of a 0.2 {$\mu$}m ferroelectric PbTiO3 film, a Au Schottky contact, and a La0.5Sr0.5CoO3 Ohmic bottom electrode. The observations are explained by a model in which the depletion width of the ferroelectric Schottky diode is determined by the polarization dependence of the internal electric field at the metal-ferroelectric interface.}
}
@article{boggild2017mapping,
title = {Mapping the Electrical Properties of Large-Area Graphene},
author = {B{\o}ggild, Peter and Mackenzie, David M. A. and Whelan, Patrick R. and Petersen, Dirch H. and Buron, Jonas Due and Zurutuza, Amaia and Gallop, John and Hao, Ling and Jepsen, Peter U.},
year = {2017},
month = sep,
journal = {2D Materials},
volume = {4},
number = {4},
pages = {042003},
publisher = {{IOP Publishing}},
issn = {2053-1583},
doi = {10/gddtd4},
abstract = {The significant progress in terms of fabricating large-area graphene films for transparent electrodes, barriers, electronics, telecommunication and other applications has not yet been accompanied by efficient methods for characterizing the electrical properties of large-area graphene. While in the early prototyping as well as research and development phases, electrical test devices created by conventional lithography have provided adequate insights, this approach is becoming increasingly problematic due to complications such as irreversible damage to the original graphene film, contamination, and a high measurement effort per device. In this topical review, we provide a comprehensive overview of the issues that need to be addressed by any large-area characterisation method for electrical key performance indicators, with emphasis on electrical uniformity and on how this can be used to provide a more accurate analysis of the graphene film. We review and compare three different, but complementary approaches that rely either on fixed contacts (dry laser lithography), movable contacts (micro four point probes) and non-contact (terahertz time-domain spectroscopy) between the probe and the graphene film, all of which have been optimized for maximal throughput and accuracy, and minimal damage to the graphene film. Of these three, the main emphasis is on THz time-domain spectroscopy, which is non-destructive, highly accurate and allows both conductivity, carrier density and carrier mobility to be mapped across arbitrarily large areas at rates that by far exceed any other known method. We also detail how the THz conductivity spectra give insights on the scattering mechanisms, and through that, the microstructure of graphene films subject to different growth and transfer processes. The perspectives for upscaling to realistic production environments are discussed.},
langid = {english},
annotation = {00037}
}
@article{borkar2017experimental,
title = {Experimental Evidence of Electronic Polarization in a Family of Photo-Ferroelectrics},
author = {Borkar, Hitesh and Rao, Vaibhav and Tomar, M. and Gupta, Vinay and F. Scott, J. and Kumar, Ashok},
year = {2017},
journal = {RSC Advances},
volume = {7},
number = {21},
pages = {12842--12855},
publisher = {{Royal Society of Chemistry}},
doi = {10.1039/C7RA00500H},
langid = {english},
keywords = {Pb1−x(Li0.5Bi0.5)x(Zr0.2Ti0.8)O3,PLBZT,Schottky}
}
@article{brenneck2020ferroelectricity,
title = {Ferroelectricity\textemdash{{A}} Revolutionary Century of Discovery},
author = {Brenneck, Geoff and Sherbondy, Rachel and Schwartz, Robert and Ihlefeld, Jon},
year = {2020},
journal = {Am. Cer. Soc. Bull},
volume = {99},
pages = {24--30},
keywords = {⛔ No DOI found}
}
@article{brotons-gisbert2016nanotexturing,
title = {Nanotexturing {{To Enhance Photoluminescent Response}} of {{Atomically Thin Indium Selenide}} with {{Highly Tunable Band Gap}}},
author = {{Brotons-Gisbert}, Mauro and {Andres-Penares}, Daniel and Suh, Joonki and Hidalgo, Francisco and Abargues, Rafael and {Rodr{\'i}guez-Cant{\'o}}, Pedro J. and Segura, Alfredo and Cros, Ana and Tobias, Gerard and Canadell, Enric and Ordej{\'o}n, Pablo and Wu, Junqiao and {Mart{\'i}nez-Pastor}, Juan P. and {S{\'a}nchez-Royo}, Juan F.},
year = {2016},
month = may,
journal = {Nano Letters},
volume = {16},
number = {5},
pages = {3221--3229},
publisher = {{American Chemical Society}},
issn = {1530-6984},
doi = {10.1021/acs.nanolett.6b00689},
abstract = {Manipulating properties of matter at the nanoscale is the essence of nanotechnology, which has enabled the realization of quantum dots, nanotubes, metamaterials, and two-dimensional materials with tailored electronic and optical properties. Two-dimensional semiconductors have revealed promising perspectives in nanotechnology. However, the tunability of their physical properties is challenging for semiconductors studied until now. Here we show the ability of morphological manipulation strategies, such as nanotexturing or, at the limit, important surface roughness, to enhance light absorption and the luminescent response of atomically thin indium selenide nanosheets. Besides, quantum-size confinement effects make this two-dimensional semiconductor to exhibit one of the largest band gap tunability ranges observed in a two-dimensional semiconductor: from infrared, in bulk material, to visible wavelengths, at the single layer. These results are relevant for the design of new optoelectronic devices, including heterostructures of two-dimensional materials with optimized band gap functionalities and in-plane heterojunctions with minimal junction defect density.},
keywords = {AFM,Band gap,flake,InSe,photoluminescence,SEM}
}
@article{brunthaler2007trap,
title = {Trap {{Model}} for the {{Metal}}-{{Insulator Transition}} in Two-dimensional {{Si}}-{{MOS}} Structures},
author = {Brunthaler, G. and H{\"o}rmann, T.},
year = {2007},
month = apr,
journal = {AIP Conference Proceedings},
volume = {893},
number = {1},
pages = {187--188},
publisher = {{American Institute of Physics}},
issn = {0094-243X},
doi = {10.1063/1.2729832}
}
@article{camjayi2008coulomb,
title = {Coulomb Correlations and the {{Wigner}}\textendash{{Mott}} Transition},
author = {Camjayi, A. and Haule, K. and Dobrosavljevi{\'c}, V. and Kotliar, G.},
year = {2008},
month = dec,
journal = {Nature Physics},
volume = {4},
number = {12},
pages = {932--935},
publisher = {{Nature Publishing Group}},
issn = {1745-2481},
doi = {10.1038/nphys1106},
abstract = {Evidence for metal\textendash insulator transitions in dilute 2D electron gases has sparked controversy and debate. A new model suggests such behaviour could arise from strong correlations driven by non-local Coulomb interactions, providing an alternative view to that which considers disorder to be the over-riding influence.},
langid = {english},
annotation = {Bandiera\_abtest: a Cg\_type: Nature Research Journals Primary\_atype: Research}
}
@article{casse2020cryogenic,
title = {Cryogenic {{Operation}} of {{Thin-Film FDSOI nMOS Transistors}}: {{The Effect}} of {{Back Bias}} on {{Drain Current}} and {{Transconductance}}},
shorttitle = {Cryogenic {{Operation}} of {{Thin-Film FDSOI nMOS Transistors}}},
author = {Cass{\'e}, M. and Paz, B. Cardoso and Ghibaudo, G. and Poiroux, T. and Barraud, S. and Vinet, M. and {de Franceschi}, S. and Meunier, T. and Gaillard, F.},
year = {2020},
month = nov,
journal = {IEEE Transactions on Electron Devices},
volume = {67},
number = {11},
pages = {4636--4640},
issn = {1557-9646},
doi = {10.1109/TED.2020.3022607},
abstract = {In this article, we have studied the drain current and transconductance of nMOS fully depleted silicon-on-insulator (FDSOI) transistors operating at low temperature (typically {$<$}; 20 K) when back gate is forward biased. Humps appear in the current, leading to oscillations of the transconductance with gate voltage, owing to mobility discontinuity due to intersubband scattering, in relation with the 2-D subband structure. The conditions for which these specific features appear in thin-film silicon-on-insulator (SOI) devices have been analyzed, by varying the temperature, drain voltage, silicon channel thickness, and gate length.},
keywords = {Fully depleted silicon-on-insulator (FDSOI),intersubband scattering,Logic gates,Scattering,Silicon,Silicon-on-insulator,Temperature,Temperature measurement,transistor,Transistors}
}
@article{celano2019atomic,
title = {The {{Atomic Force Microscopy}} for {{Nanoelectronics}}},
author = {Celano, Umberto},
year = {2019},
journal = {Electrical Atomic Force Microscopy for Nanoelectronics},
pages = {1--28},
publisher = {{Springer, Cham}},
doi = {10.1007/978-3-030-15612-1_1},
abstract = {The invention of scanning tunneling microscopy (STM), rapidly followed by atomic force microscopy (AFM), occurred at the time when extensive research on sub-\textmu m metal oxide field-effect transistors...},
langid = {english},
annotation = {00000}
}
@article{chaiken2003structural,
title = {Structural and Electronic Properties of Amorphous and Polycrystalline {{In}}{\textsubscript{2}}{{Se}}{\textsubscript{3}} Films},
author = {Chaiken, A. and Nauka, K. and Gibson, G. A. and Lee, Heon and Yang, C. C. and Wu, J. and Ager, J. W. and Yu, K. M. and Walukiewicz, W.},
year = {2003},
month = aug,
journal = {Journal of Applied Physics},
volume = {94},
number = {4},
pages = {2390--2397},
publisher = {{American Institute of Physics}},
issn = {0021-8979},
doi = {10.1063/1.1592631},
keywords = {conductivity,In2Se3 κ}
}
@article{chandra2007landau,
title = {A {{Landau Primer}} for {{Ferroelectrics}}},
author = {Chandra, Premi and Littlewood, Peter B.},
year = {2007},
journal = {Physics of Ferroelectrics},
pages = {69--116},
publisher = {{Springer, Berlin, Heidelberg}},
doi = {10.1007/978-3-540-34591-6_3},
abstract = {This contribution begins with a discussion of the homogeneous Landau theory for bulk ferroelectrics with spatially uniform polarizations, reviewing first- and second-order transitions and the...},
langid = {english}
}
@article{chang2018synthesis,
title = {Synthesis of {{Large-Area InSe Monolayers}} by {{Chemical Vapor Deposition}}},
author = {Chang, Han-Ching and Tu, Chien-Liang and Lin, Kuang-I and Pu, Jiang and Takenobu, Taishi and Hsiao, Chien-Nan and Chen, Chang-Hsiao},
year = {2018},
month = sep,
journal = {Small},
volume = {14},
number = {39},
pages = {1802351},
publisher = {{John Wiley \& Sons, Ltd}},
issn = {1613-6810},
doi = {10.1002/smll.201802351},
abstract = {Abstract Recently, 2D materials of indium selenide (InSe) layers have attracted much attention from the scientific community due to their high mobility transport and fascinating physical properties. To date, reports on the synthesis of high-quality and scalable InSe atomic films are limited. Here, a synthesis of InSe atomic layers by vapor phase selenization of In2O3 in a chemical vapor deposition (CVD) system, resulting in large-area monolayer flakes or thin films, is reported. The atomic films are continuous and uniform over a large area of 1 ? 1 cm2, comprising of primarily InSe monolayers. Spectroscopic and microscopic measurements reveal the highly crystalline nature of the synthesized InSe monolayers. The ion-gel-gated field-effect transistors based on CVD InSe monolayers exhibit n-type channel behaviors, where the field effect electron mobility values can be up to {$\approx$}30 cm2 V?1 s?1 along with an on/off current ratio, of {$>$}104 at room temperature. In addition, the graphene can serve as a protection layer to prevent the oxidation between InSe and the ambient environment. Meanwhile, the synthesized InSe films can be transferred to arbitrary substrates, enabling the possibility of reassembly of various 2D materials into vertically stacked heterostructures, prompting research efforts to probe its characteristics and applications.},
keywords = {AFM,Band gap,FET,film,graphene,Heterostructure,InSe ε (2H),ionic gating,mobility,monolayer,n-type,photoluminescence,Raman,Raman peaks,SAED,SEM,TEM,XPS}
}
@article{chen2013conduction,
title = {The Conduction Mechanism of Large on/off Ferroelectric Diode Currents in Epitaxial (111) {{BiFeO}}{\textsubscript{3}} Thin Film},
author = {Chen, Zhihui and He, Long and Zhang, Fan and Jiang, Jun and Meng, Jianwei and Zhao, Boyuan and Jiang, Anquan},
year = {2013},
month = may,
journal = {Journal of Applied Physics},
volume = {113},
number = {18},
pages = {184106},
publisher = {{American Institute of Physics}},
issn = {0021-8979},
doi = {10.1063/1.4804144},
abstract = {The large ferroelectric diode current modulated by bipolar polarization in epitaxial (111) BiFeO3 thin film has been observed. With the survey of different current leakage models, it is found that the space-charge limited current dominates the conduction. For the intrinsic physical understanding, the rectification of diode currents near domain coercive fields is attributed to gradient distribution of the trap charges between top and bottom electrode/ferroelectric interfaces, and the distributed charges can be reversed upon polarization reversal. Moreover, the retention time of the On and Off diode currents is over 104\,s with their ratio of around 5:1.},
keywords = {BiFeO3,Poole-Frenkel,Schottky}
}
@article{chen2015probing,
title = {Probing the Electron States and Metal-Insulator Transition Mechanisms in Molybdenum Disulphide Vertical Heterostructures},
author = {Chen, Xiaolong and Wu, Zefei and Xu, Shuigang and Wang, Lin and Huang, Rui and Han, Yu and Ye, Weiguang and Xiong, Wei and Han, Tianyi and Long, Gen and Wang, Yang and He, Yuheng and Cai, Yuan and Sheng, Ping and Wang, Ning},
year = {2015},
month = jan,
journal = {Nature Communications},
volume = {6},
number = {1},
pages = {6088},
publisher = {{Nature Publishing Group}},
issn = {2041-1723},
doi = {10.1038/ncomms7088},
abstract = {The metal-insulator transition is one of the remarkable electrical properties of atomically thin molybdenum disulphide. Although the theory of electron\textendash electron interactions has been used in modelling the metal-insulator transition in molybdenum disulphide, the underlying mechanism and detailed transition process still remain largely unexplored. Here we demonstrate that the vertical metal-insulator-semiconductor heterostructures built from atomically thin molybdenum disulphide are ideal capacitor structures for probing the electron states. The vertical configuration offers the added advantage of eliminating the influence of large impedance at the band tails and allows the observation of fully excited electron states near the surface of molybdenum disulphide over a wide excitation frequency and temperature range. By combining capacitance and transport measurements, we have observed a percolation-type metal-insulator transition, driven by density inhomogeneities of electron states, in monolayer and multilayer molybdenum disulphide. In addition, the valence band of thin molybdenum disulphide layers and their intrinsic properties are accessed.},
langid = {english},
annotation = {Bandiera\_abtest: a Cg\_type: Nature Research Journals Primary\_atype: Research Subject\_term: Electronic properties and materials;Semiconductors Subject\_term\_id: electronic-properties-and-materials;semiconductors}
}
@article{chen2019phononmediated,
title = {Phonon-Mediated Superconductivity in Electron-Doped Monolayer {{InSe}}: {{A}} First-Principles Investigation},
shorttitle = {Phonon-Mediated Superconductivity in Electron-Doped Monolayer {{InSe}}},
author = {Chen, Jianyong},
year = {2019},
month = feb,
journal = {Journal of Physics and Chemistry of Solids},
volume = {125},
pages = {23--30},
issn = {0022-3697},
doi = {10.1016/j.jpcs.2018.09.039},
abstract = {In this study, we investigated the electron\textendash phonon coupling and superconductivity properties of an electron-doped indium selenide (InSe) monolayer for the first time. Electron doping at 0.1 e/cell induced significant phonon softening of the acoustic ZA mode, a lower frequency E{${''}$} mode, and higher frequency A{${'}$}1 mode, which were responsible for the electron\textendash phonon coupling. Under greater doping at 0.2 e/cell, the electronic density of states at the Fermi level increased remarkably and the two Fermi sheets around {$\Gamma$} and M expanded. The transition temperature increased to 3.41 K according to the McMillan\textendash Allen\textendash Dynes formula, which is higher than that of 1.7 K in silicene with doping at 0.44 e/atom and 2.85 K in Na-intercalated MoS2 bilayers calculated using the same method. The phonon-mediated superconductivity predicted in this study combined with the topologically nontrivial characteristics reported previously suggest that few-layer InSe is a potential platform for achieving topologically superconductivity in two dimensions.},
langid = {english},
keywords = {DFT,InSe,Superconductivity},
annotation = {00001}
}
@article{chen2020couplings,
title = {Couplings of {{Polarization}} with {{Interfacial Deep Trap}} and {{Schottky Interface Controlled Ferroelectric Memristive Switching}}},
author = {Chen, Aiping and Zhang, Wenrui and Dedon, Liv R. and Chen, Di and Khatkhatay, Fauzia and {MacManus-Driscoll}, Judith L. and Wang, Haiyan and Yarotski, Dmitry and Chen, Jun and Gao, Xingsun and Martin, Lane W. and Roelofs, Andreas and Jia, Quanxi},
year = {2020},
month = oct,
journal = {Advanced Functional Materials},
volume = {30},
number = {43},
pages = {2000664},
publisher = {{John Wiley \& Sons, Ltd}},
issn = {1616-301X},
doi = {10.1002/adfm.202000664},
abstract = {Abstract Memristors with excellent scalability have the potential to revolutionize not only the field of information storage but also neuromorphic computing. Conventional metal oxides are widely used as resistive switching materials in memristors. Interface-type memristors based on ferroelectric materials are emerging as alternatives in the development of high-performance memory devices. A clear understanding of the switching mechanisms in this type of memristors, however, is still in its early stages. By comparing the bipolar switching in different systems, it is found that the switchable diode effect in ferroelectric memristors is controlled by polarization modulated Schottky barrier height and polarization coupled interfacial deep states trapping/detrapping. Using semiconductor theories with consideration of polarization effects, a phenomenological theory is developed to explain the current?voltage behavior at the metal/ferroelectric interface. These findings reveal the critical role of the interaction among polarization charges, interfacial defects, and Schottky interface in controlling ferroelectric resistive switching and offer the guidance to design ferroelectric memristors with enhanced performance.},
keywords = {ferroelectrics,memristive switching,metal/oxide interfaces,oxide thin films,semiconductors}
}
@article{chen2020lattice,
title = {Lattice Vibration Characteristics in Layered {{InSe}} Films and the Electronic Behavior of Field-Effect Transistors},
author = {Chen, Fangfang and Cui, Anyang and Wang, Xiang and Gao, Caifang and Xu, Liping and Jiang, Kai and Zhang, Jinzhong and Hu, Zhigao and Chu, Junhao},
year = {2020},
month = jun,
journal = {Nanotechnology},
volume = {31},
number = {33},
pages = {335702},
publisher = {{IOP Publishing}},
issn = {0957-4484},
doi = {10.1088/1361-6528/ab8df1},
abstract = {Understanding how temperature affects the structural and electronic properties for two-dimensional (2D) semiconductors could promote the application and development of nanoelectronic devices. Here, the temperature dependence of lattice structure for indium selenide (InSe) nanosheets and the corresponding electronic properties of 3 nm indium-deposited InSe field-effect transistors (FETs) are systematically demonstrated. Analyses of Raman spectra suggest that the difference of phonon frequency ({$\Delta\omega$}) for the A mode is found to be 3.14 cm-1, which is larger than that of the E mode due to the stronger electron-phonon coupling for the A mode. The device performance based on indium-deposited InSe is systematically explained using Kelvin probe force microscopy (KPFM) and the predicted energy band structure. Furthermore, FETs based on temperature and variable thickness InSe flakes are designed as applicable devices. Our findings are of fundamental importance to explain the underlying physics in intrinsic InSe transistors and improve further applications.},
langid = {english},
keywords = {FET,flakes,InSe ε (2H),mobility,mobility-temperature,Raman,Raman peaks,Raman temperature}
}
@article{chen2021atomic,
title = {Atomic {{Imaging}} of {{Electrically Switchable Striped Domains}} in {$\beta$}'-{{In}}{\textsubscript{2}}{{Se}}{\textsubscript{3}}},
author = {Chen, Zhi and Fu, Wei and Wang, Lin and Yu, Wei and Li, Haohan and Tan, Clement Kok Yong and Abdelwahab, Ibrahim and Shao, Yan and Su, Chenliang and Sun, Mingzi and Huang, Bolong and Loh, Kian Ping},
year = {2021},
month = jul,
journal = {Advanced Science},
volume = {n/a},
number = {n/a},
pages = {2100713},
publisher = {{John Wiley \& Sons, Ltd}},
issn = {2198-3844},
doi = {10.1002/advs.202100713},
abstract = {Abstract 2D ferroelectricity in van-der-Waals-stacked materials such as indium selenide (In2Se3) has attracted interests because the ferroelectricity is robust even in ultrathin layers, which is useful for the miniaturization of ferroelectric field effect transistors. To implement In2Se3 in nanoscale ferroelectric devices, an understanding of the domain structure and switching dynamics in the 2D limit is essential. In this study, a biased scanning tunnelling microscopy (STM) tip is used to locally switch polarized domains in ??-In2Se3, and the reconfiguration of these domains are directly visualized using STM. The room-temperature surface of ??-In2Se3 breaks into 1D nanostriped domains, which changes into a zig-zag striped domains of ?? phase at low temperatures. These two types of domains can coexist, and by applying a tip-sample bias, they can be interchangeably switched locally, showing volatile or nonvolatile like behavior depending on the threshold voltage applied. An atomic model is proposed to explain the switching mechanism based on tip-induced flexoelectric effect and the ferroelastic switching between ?? and ?? phases.},
keywords = {antiferroelectrics,ferroelectric,In2Se3 β',phase transition,phase transition β' temperature,STM}
}
@article{cheng2018highperformance,
title = {High-Performance, Multifunctional Devices Based on Asymmetric van Der {{Waals}} Heterostructures},
author = {Cheng, Ruiqing and Wang, Feng and Yin, Lei and Wang, Zhenxing and Wen, Yao and Shifa, Tofik Ahmed and He, Jun},
year = {2018},
month = jun,
journal = {Nature Electronics},
volume = {1},
number = {6},
pages = {356--361},
publisher = {{Nature Publishing Group}},
issn = {2520-1131},
doi = {10.1038/s41928-018-0086-0},
abstract = {Two-dimensional materials are of interest for the development of electronic devices due to their useful properties and compatibility with silicon-based technology. Van der Waals heterostructures, in which two-dimensional materials are stacked on top of each other, allow different materials and properties to be combined and for multifunctional devices to be created. Here we show that an asymmetric van der Waals heterostructure device, which is composed of graphene, hexagonal boron nitride, molybdenum disulfide and molybdenum ditelluride, can function as a high-performance diode, transistor, photodetector and programmable rectifier. Due to the asymmetric structure of the device, charge-carrier injection can be switched between tunnelling and thermal activation under negative and positive bias conditions, respectively. As a result, the device exhibits a high current on/off ratio of 6\,\texttimes\,108 and a rectifying ratio of \textasciitilde 108. The device can also function as a programmable rectifier with stable retention and continuously tunable memory states, as well as a high program/erase current ratio of \textasciitilde 109 and a rectification ratio of \textasciitilde 107.},
copyright = {2018 The Author(s)},
langid = {english},
annotation = {Bandiera\_abtest: a Cg\_type: Nature Research Journals Primary\_atype: Research Subject\_term: Electronic devices;Electronic properties and materials;Two-dimensional materials Subject\_term\_id: electronic-devices;electronic-properties-and-materials;two-dimensional-materials}
}
@article{choi2008plasma,
title = {Plasma Etching of {{As}}{\textsubscript{2}}{{S}}{\textsubscript{3}} Films for Optical Waveguides},
author = {Choi, Duk-Yong and Maden, Steve and Rode, Andrei and Wang, Rongping and {Luther-Davies}, Barry},
year = {2008},
month = jun,
journal = {Journal of Non-Crystalline Solids},
volume = {354},
number = {27},
pages = {3179--3183},
issn = {0022-3093},
doi = {10.1016/j.jnoncrysol.2008.01.014},
abstract = {Chalcogenide glasses are good candidate materials for ultra-fast non-linear optic devices. In this work, we present the photolithographic process and the plasma etching of arsenic tri-sulphide (As2S3) film. The films were deposited on thermally oxidized silicon substrates by ultra-fast pulsed laser deposition. To protect As2S3 film from photo-resist developer, thin resist layer {$\sim$}100\textendash 200nm was remained on the UV exposed area by controlling resist development time. After removing the protective layer in oxygen plasma, As2S3 waveguides were patterned in inductively coupled plasma reactive ion etching (ICP-RIE) system using CF4\textendash O2 gas mixture. We investigated the etch rate and the etch selectivity to photo-resist of As2S3 as a function of bias power, induction power, operating pressure, and gas flow rate ratio of CF4 and O2. The film is mainly etched by the chemical reaction with fluorine radicals. The content of oxygen in the plasma determines the etched sidewall profiles and nearly vertical profile was obtained at high oxygen content plasma.},
keywords = {Chalcogenides,Laser deposition,Planar waveguides,Processing},
annotation = {ZSCC: 0000040}
}
@article{choi2008protective,
title = {A Protective Layer on {{As}}{\textsubscript{2}}{{S}}{\textsubscript{3}} Film for Photo-Resist Patterning},
author = {Choi, D.-Y. and Madden, S. and Rode, A. and Wang, R. and Bulla, D. and {Luther-Davies}, B.},
year = {2008},
journal = {Journal of Non-Crystalline Solids},
volume = {354},
number = {47-51},
pages = {5253--5254},
doi = {10.1016/j.jnoncrysol.2008.05.067},
abstract = {We have developed an effective fabrication process for As2S3 planar waveguides. A bottom anti-reflection coating provides a layer that not only protects the As2S3 film from attack by the alkaline developer but also improves line edge roughness of photo-resist patterns which is a pre-requisite for waveguides with smooth sidewalls. Crown Copyright \textcopyright{} 2008.},
keywords = {Chalcogenides,Chemical durability,Planar waveguides,Processing,Vapor phase deposition},
annotation = {ZSCC: 0000015}
}
@article{choi2011su8,
title = {{{SU-8}} Protective Layer in Photo-Resist Patterning on {{As}}{\textsubscript{2}}{{S}}{\textsubscript{3}} Film},
author = {Choi, Duk-Yong and Madden, Steve and Bulla, Douglas and Rode, Andrei and Wang, Rongping and Luther-Davies, Barry},
year = {2011},
journal = {physica status solidi c},
volume = {8},
number = {11-12},
pages = {3183--3186},
issn = {1610-1642},
doi = {10.1002/pssc.201000741},
abstract = {Amorphous chalcogenide thin films, especially arsenic tri-sulphide (As2S3) are emerging as an excellent platform for integrated non-linear optic devices due to their high non-linearity as well as low linear and nonlinear optical loss. Fabricating planar As2S3 waveguides, however, is not straightforward because As2S3 is dissolved in alkalis such as photo-resist developer. In this study we present the application of thin SU-8 film as a protective layer to prevent the attack of the developer on the As2S3 during photolithographic process. Despite excellent coating feature and simple process of SU-8 as a protective layer, the delamination between SU-8 and polymer cladding during chip cleaving hindered its application. We deposited thin Al2O3 on SU-8 by atomic layer deposition and this intermediate layer could solve the problem. We measured the insertion losses of fabricated waveguides as a function of device lengths and widths. The propagation loss becomes significant in a narrow guide due to the enhanced surface scattering. It was clear that extra losses were engaged in long guides containing bending structures. SU-8 layer and thin Al2O3 combination allowed reliable and repeatable fabrication process in that it did not induce any extra light scattering or absorption and prevented attack of the As2S3 film by the alkaline developer. Moreover, the device characterisation revealed that SU-8 layer is superior to PMMA/BARC in terms of propagation loss of waveguide (\textcopyright{} 2011 WILEY-VCH Verlag GmbH \& Co. KGaA, Weinheim)},
copyright = {Copyright \textcopyright{} 2011 WILEY-VCH Verlag GmbH \& Co. KGaA, Weinheim},
langid = {english},
keywords = {As2S3,chalcogenide glass,Chalcogenide glass,SU-8 protective layer,waveguides,Waveguides},
annotation = {ZSCC: 0000011}
}
@article{choi2017electrically,
title = {Electrically {{Driven Reversible Phase Changes}} in {{Layered In}}{\textsubscript{2}}{{Se}}{\textsubscript{3}} {{Crystalline Film}}},
author = {Choi, Min Sup and Cheong, Byung-ki and Ra, Chang Ho and Lee, Suyoun and Bae, Jee-Hwan and Lee, Sungwoo and Lee, Gun-Do and Yang, Cheol-Woong and Hone, James and Yoo, Won Jong},
year = {2017},
month = nov,
journal = {Advanced Materials},
volume = {29},
number = {42},
pages = {1703568},
publisher = {{John Wiley \& Sons, Ltd}},
issn = {0935-9648},
doi = {10/ggpmfj},
abstract = {Abstract An unconventional phase-change memory (PCM) made of In2Se3, which utilizes reversible phase changes between a low-resistance crystalline ? phase and a high-resistance crystalline ? phase is reported for the first time. Using a PCM with a layered crystalline film exfoliated from In2Se3 crystals on a graphene bottom electrode, it is shown that SET/RESET programmed states form via the formation/annihilation of periodic van der Waals' (vdW) gaps (i.e., virtual vacancy layers) in the stack of atomic layers and the concurrent reconfiguration of In and Se atoms across the layers. From density functional theory calculations, ? and ? phases, characterized by octahedral bonding with vdW gaps and tetrahedral bonding without vdW gaps, respectively, are shown to have energy bandgap value of 0.78 and 1.86 eV, consistent with a metal-to-insulator transition accompanying the ?-to-? phase change. The monolithic In2Se3 layered film reported here provides a novel means to achieving a PCM based on melting-free, low-entropy phase changes in contrast with the GeTe?Sb2Te3 superlattice film adopted in interfacial phase-change memory.},
keywords = {device,In2Se3 α (3R),In2Se3 β,In2Se3 γ,indium selenides,layered materials,metal-to-insulator transition,phase transition,phase transition β-γ,SAED,STEM,vacancy layers},
annotation = {00028 ZSCC: 0000028}
}
@article{choi2020multiterminal,
title = {Multiterminal {{Transport Measurements}} of {{Multilayer InSe Encapsulated}} by {{hBN}}},
author = {Choi, YiTaek and Seok, Yongwook and Jang, Hanbyeol and Kumar, Arvind Shankar and Watanabe, Kenji and Taniguchi, Takashi and Gao, Xuan P. A. and Lee, Kayoung},
year = {2020},
month = dec,
journal = {ACS Applied Electronic Materials},
pages = {acsaelm.0c00771},
issn = {2637-6113, 2637-6113},
doi = {10.1021/acsaelm.0c00771},
abstract = {We investigate transport properties and scattering mechanisms of high-mobility InSe nanosheets, encapsulated by hBN, via four-terminal measurements. The measured conductivities increase as temperature (T) decreases, showing a metallic behavior at gate voltages above a threshold voltage, in contrast to the metal-insulator transition occurring at a high gate voltage observed in the two-terminal conductance of InSe. Phonon-limited and impurity-limited mobilities were separated for each carrier density (n) and T. Extracted impurity-limited mobility values are weakly dependent on n due to dominant short-range scatterers, while phonon-limited mobility values decrease as n increases due to second subband occupation and increased electron-phonon scattering.},
langid = {english},
keywords = {Carrier density,flake,Heterostructure,InSe,mobility,Raman,Raman peaks,Resistivity/conductivity,Resistivity/conductivity-temperature,variable range hopping},
annotation = {00000 ZSCC: 0000000}
}
@article{church2018effect,
title = {Effect of Stacking Faults on the Photoluminescence Spectrum of Zincblende {{GaN}}},
author = {Church, S. A. and Hammersley, S. and Mitchell, P. W. and Kappers, M. J. and Lee, L. Y. and Massabuau, F. and Sahonta, S. L. and Frentrup, M. and Shaw, L. J. and Wallis, D. J. and Humphreys, C. J. and Oliver, R. A. and Binks, D. J. and Dawson, P.},
year = {2018},
month = may,
journal = {Journal of Applied Physics},
volume = {123},
number = {18},
pages = {185705},
publisher = {{American Institute of Physics}},
issn = {0021-8979},
doi = {10.1063/1.5026267},
abstract = {The photoluminescence spectra of a zincblende GaN epilayer grown via metal-organic chemical vapour deposition upon 3C-SiC/Si (001) substrates were investigated. Of particular interest was a broad emission band centered at 3.4\,eV, with a FWHM of 200\,meV, which extends above the bandgap of both zincblende and wurtzite GaN. Photoluminescence excitation measurements show that this band is associated with an absorption edge centered at 3.6\,eV. Photoluminescence time decays for the band are monoexponential, with lifetimes that reduce from 0.67\,ns to 0.15\,ns as the recombination energy increases. TEM measurements show no evidence of wurtzite GaN inclusions which are typically used to explain emission in this energy range. However, dense stacking fault bunches are present in the epilayers. A model for the band alignment at the stacking faults was developed to explain this emission band, showing how both electrons and holes can be confined adjacent to stacking faults. Different stacking fault separations can change the carrier confinement energies sufficiently to explain the width of the emission band, and change the carrier wavefunction overlap to account for the variation in decay time.}
}
@article{collins2019quantitative,
title = {Quantitative {{Electromechanical Atomic Force Microscopy}}},
author = {Collins, Liam and Liu, Yongtao and Ovchinnikova, Olga S. and Proksch, Roger},
year = {2019},
month = jul,
journal = {ACS Nano},
volume = {13},
number = {7},
pages = {8055--8066},
publisher = {{American Chemical Society}},
issn = {1936-0851},
doi = {10.1021/acsnano.9b02883},
abstract = {The ability to probe a material's electromechanical functionality on the nanoscale is critical to applications from energy storage and computing to biology and medicine. Voltage-modulated atomic force microscopy (VM-AFM) has become a mainstay characterization tool for investigating these materials due to its ability to locally probe electromechanically responsive materials with spatial resolution from micrometers to nanometers. However, with the wide popularity of VM-AFM techniques such as piezoresponse force microscopy and electrochemical strain microscopy there has been a rise in reports of nanoscale electromechanical functionality, including hysteresis, in materials that should be incapable of exhibiting piezo- or ferroelectricity. Explanations for the origins of unexpected nanoscale phenomena have included new material properties, surface-mediated polarization changes, and/or spatially resolved behavior that is not present in bulk measurements. At the same time, it is well known that VM-AFM measurements are susceptible to numerous forms of crosstalk, and, despite efforts within the AFM community, a global approach for eliminating this has remained elusive. In this work, we develop a method for easily demonstrating the presence of hysteretic (i.e., ``false ferroelectric'') long-range interactions between the sample and cantilever body. This method should be easy to implement in any VM-AFM measurement. We then go on to demonstrate fully quantitative and repeatable nanoelectromechanical characterization using an interferometer. These quantitative measurements are critical for a wide range of devices including MEMS actuators and sensors, memristor, energy storage, and memory.},
annotation = {00040}
}
@article{collins2020electronic,
title = {Electronic {{Band Structure}} of {{In-Plane Ferroelectric}} van Der {{Waals}} {$\beta$}'-{{In}}{\textsubscript{2}}{{Se}}{\textsubscript{3}}},
author = {Collins, James L. and Wang, Chutian and Tadich, Anton and Yin, Yuefeng and Zheng, Changxi and Hellerstedt, Jack and {Grubi{\v s}i{\'c}-{\v C}abo}, Antonija and Tang, Shujie and Mo, Sung-Kwan and Riley, John and Huwald, Eric and Medhekar, Nikhil V. and Fuhrer, Michael S. and Edmonds, Mark T.},
year = {2020},
month = jan,
journal = {ACS Applied Electronic Materials},
volume = {2},
number = {1},
pages = {213--219},
publisher = {{American Chemical Society}},
doi = {10.1021/acsaelm.9b00699},
abstract = {Layered indium selenides (In2Se3) have recently been discovered to host robust out-of-plane and in-plane ferroelectricity in the {$\alpha$}- and {$\beta{'}$}-phases, respectively. In this work, we utilize angle-resolved photoelectron spectroscopy to directly measure the electronic band structure of {$\beta{'}$}-In2Se3 and compare to hybrid density functional theory (DFT) calculations. In agreement with DFT, we find the band structure is highly two-dimensional, with negligible dispersion along the c-axis. Because of n-type doping we can observe the conduction band minima and directly measure the minimum indirect (0.97 eV) and direct (1.46 eV) bandgaps. We find the Fermi surface in the conduction band is characterized by anisotropic electron pockets with sharp in-plane dispersion about the {$\overline M$} points, yielding effective masses of 0.21m0 along KM and 0.33m0 along {$\Gamma$}M. The measured band structure is well supported by hybrid density functional theory calculations. The highly two-dimensional (2D) band structure with moderate bandgap and small effective mass suggests that {$\beta{'}$}-In2Se3 is a potentially useful van der Waals semiconductor. This, together with its ferroelectricity makes it a viable material for high-mobility ferroelectric\textendash photovoltaic devices, with applications in nonvolatile memory switching and renewable energy technologies.},
keywords = {ARPES,Band gap,band structure,ferroelectric,In2Se3 β',phase transition β' temperature},
annotation = {00000 ZSCC: 0000000}
}
@article{cui2018intercorrelated,
title = {Intercorrelated {{In-Plane}} and {{Out-of-Plane Ferroelectricity}} in {{Ultrathin Two-Dimensional Layered Semiconductor In}}{\textsubscript{2}}{{Se}}{\textsubscript{3}}},
author = {Cui, Chaojie and Hu, Wei-Jin and Yan, Xingxu and Addiego, Christopher and Gao, Wenpei and Wang, Yao and Wang, Zhe and Li, Linze and Cheng, Yingchun and Li, Peng and Zhang, Xixiang and Alshareef, Husam N. and Wu, Tom and Zhu, Wenguang and Pan, Xiaoqing and Li, Lain-Jong},
year = {2018},
month = feb,
journal = {Nano Letters},
volume = {18},
number = {2},
pages = {1253--1258},
publisher = {{American Chemical Society}},
issn = {1530-6984},
doi = {10.1021/acs.nanolett.7b04852},
abstract = {Enriching the functionality of ferroelectric materials with visible-light sensitivity and multiaxial switching capability would open up new opportunities for their applications in advanced information storage with diverse signal manipulation functions. We report experimental observations of robust intralayer ferroelectricity in two-dimensional (2D) van der Waals layered {$\alpha$}-In2Se3 ultrathin flakes at room temperature. Distinct from other 2D and conventional ferroelectrics, In2Se3 exhibits intrinsically intercorrelated out-of-plane and in-plane polarization, where the reversal of the out-of-plane polarization by a vertical electric field also induces the rotation of the in-plane polarization. On the basis of the in-plane switchable diode effect and the narrow bandgap ({$\sim$}1.3 eV) of ferroelectric In2Se3, a prototypical nonvolatile memory device, which can be manipulated both by electric field and visible light illumination, is demonstrated for advancing data storage technologies.},
keywords = {device,ferroelectric,In2Se3 α (3R),In2Se3 β,InSe γ (3R),PFM,Raman,SAED,STEM,Switching/FTJ,TEM},
annotation = {00166 ZSCC: 0000166 146 citations (Crossref) [2021-02-02]}
}
@article{dai2019robust,
title = {Robust {{Piezo-Phototronic Effect}} in {{Multilayer}} {$\gamma$}-{{InSe}} for {{High-Performance Self-Powered Flexible Photodetectors}}},
author = {Dai, Mingjin and Chen, Hongyu and Wang, Fakun and Hu, Yunxia and Wei, Shuai and Zhang, Jia and Wang, Zhiguo and Zhai, Tianyou and Hu, PingAn},
year = {2019},
month = jun,
journal = {ACS Nano},
volume = {13},
number = {6},
pages = {7291--7299},
publisher = {{American Chemical Society}},
issn = {1936-0851},
doi = {10.1021/acsnano.9b03278},
abstract = {The piezo-phototronic effect has been promising as an effective means to improve the performance of two-dimensional (2D) semiconductor based optoelectronic devices. However, the current reported monolayer 2D semiconductors are not regarded as suitable for actual flexible piezotronic photodetectors due to their insufficient optical absorption and mechanical durability, although they possess strong piezoelectricity. In this work, we demonstrate that, unlike 2H-phase transition-metal dichalcogenides, {$\gamma$}-phase InSe with a hexagonal unit cell possesses broken inversion symmetry in all the layer numbers and has a strong second-harmonic generation effect. Moreover, driven by the piezo-phototronic effect, a flexible self-powered photodetector based on multilayer {$\gamma$}-InSe, which can work without any energy supply, is proposed. The device exhibited ultrahigh photon responsivity of 824 mA/W under light illuminations of 400 nm (0.368 mW/cm2). Moreover, the responsivity and response speed of this photodetector were enhanced further by as much as 696\% and 1010\%, respectively, when a 0.62\% uniaxial tensile strain was applied. Our devices exhibit high reliability and stability during a 6 month test time. These significant findings offer a promising pathway to construct high-performance flexible piezo-phototronic photodetectors based on multilayer 2D semiconductors.},
keywords = {device,flake,InSe β (2H),InSe γ (3R),photo-transport,Piezoelectric,Raman,second harmonic generation,TEM}
}
@article{dai2019twodimensional,
title = {Two-{{Dimensional}} van Der {{Waals Materials}} with {{Aligned In-Plane Polarization}} and {{Large Piezoelectric Effect}} for {{Self-Powered Piezoelectric Sensors}}},
author = {Dai, Mingjin and Wang, Zhiguo and Wang, Fakun and Qiu, Yunfeng and Zhang, Jia and Xu, Cheng-Yan and Zhai, Tianyou and Cao, Wenwu and Fu, Yongqing and Jia, Dechang and Zhou, Yu and Hu, Ping-An},
year = {2019},
month = aug,
journal = {Nano Letters},
volume = {19},
number = {8},
pages = {5410--5416},
publisher = {{American Chemical Society}},
issn = {1530-6984},
doi = {10.1021/acs.nanolett.9b01907},
abstract = {Piezoelectric two-dimensional (2D) van der Waals (vdWs) materials are highly desirable for applications in miniaturized and flexible/wearable devices. However, the reverse-polarization between adjacent layers in current 2D layered materials results in decreasing their in-plane piezoelectric coefficients with layer number, which limits their practical applications. Here, we report a class of 2D layered materials with an identical orientation of in-plane polarization. Their piezoelectric coefficients (e22) increase with layer number, thereby allowing for the fabrication of flexible piezotronic devices with large piezoelectric responsivity and excellent mechanical durability. The piezoelectric outputs can reach up to 0.363 V for a 7-layer {$\alpha$}-In2Se3 device, with a current responsivity of 598.1 pA for 1\% strain, which is 1 order of magnitude higher than the values of the reported 2D piezoelectrics. The self-powered piezoelectric sensors made of these newly developed 2D layered materials have been successfully used for real-time health monitoring, proving their suitability for the fabrication of flexible piezotronic devices due to their large piezoelectric responses and excellent mechanical durability.},
keywords = {DFT,InSe γ (3R),Piezoelectric,Raman,second harmonic generation},
annotation = {ZSCC: NoCitationData[s0]}
}
@book{dai2020ferroic,
title = {Ferroic {{Materials}} for {{Smart Systems}}},
author = {Dai, Jiyan},
year = {2020},
month = jan,
publisher = {{John Wiley \& Sons, Ltd}},
doi = {10.1002/9783527815388},
isbn = {978-3-527-34476-5},
langid = {english},
annotation = {00000}
}
@article{dai2020intrinsic,
title = {Intrinsic {{Dipole Coupling}} in {{2D}} van Der {{Waals Ferroelectrics}} for {{Gate-Controlled Switchable Rectifier}}},
author = {Dai, Mingjin and Li, Kai and Wang, Fakun and Hu, Yunxia and Zhang, Jia and Zhai, Tianyou and Yang, Bin and Fu, Yongqing and Cao, Wenwu and Jia, Dechang and Zhou, Yu and Hu, PingAn},
year = {2020},
month = feb,
journal = {Advanced Electronic Materials},
volume = {6},
number = {2},
pages = {1900975},
publisher = {{John Wiley \& Sons, Ltd}},
issn = {2199-160X},
doi = {10.1002/aelm.201900975},
abstract = {Abstract Miniaturization of device elements, such as ferroelectric diodes, depends on the downscaling of ferroelectric film, which is also crucial for developing high-density information storage technologies of ferroelectric random access memories (FeRAMs). Recently emerged ferroelectric two-dimensional (2D) van der Waals (vdWs) layered materials bring an additional opportunity to further increase the density of FeRAMs. A lateral, switchable rectifier is designed and fabricated based on atomically thin 2D {$\alpha$}-In2Se3 ferroelectric diodes, thus breaking the thickness limitation of conventional ferroelectric films and achieving an unprecedented level of miniaturization. This is realized through the interrelated coupling between out-of-plane and in-plane dipoles at room temperature; that is, horizontal polarization reversal can be effectively controlled through a vertical electric field. Being further explored as a switchable rectifier, the obtained maximum value of rectification ratio for the {$\alpha$}-In2Se3 based ferroelectric diode can reach up to 2.5 ? 103. These results indicate that 2D ferroelectric semiconductors can offer a pathway to develop next-generation multifunctional electronics.},
keywords = {device,ferroelectric,In2Se3 α (3R),PFM,rectifying junction,second harmonic generation},
annotation = {00000}
}
@article{darwish2013structural,
title = {Structural and Electrical Studies on Nanostructured {{InSe}} Thin Films},
author = {Darwish, A. A. A. and {El-Nahass}, M. M. and Bahlol, M. H.},
year = {2013},
month = jul,
journal = {Applied Surface Science},
volume = {276},
pages = {210--216},
issn = {0169-4332},
doi = {10.1016/j.apsusc.2013.03.068},
abstract = {InSe powder was found to be polycrystalline with hexagonal system. X-ray diffraction and scanning electron microscopy results confirmed that the InSe films have nanostructure nature. The heat treatment enhance the crystallite size. The dark electrical conductivity of InSe films showed that the dominant conduction is through the extended states in the temperature range 293\textendash 473K. Thermoelectric properties show a negative sign exhibiting n-type semiconductig nature of films. Current density\textendash voltage characteristics of InSe films showed Ohmic conduction in the lower voltage range, and space charge limited conductivity (SCLC) in the relatively high-voltage range. The SCLC was controlled by an exponential distribution of traps below the conduction band. The temperature dependence of the current density allowed the calculation of some essential parameters.},
langid = {english},
keywords = {Annealing,device,film,InSe,mobility,n-type,Resistivity/conductivity,SCLC,SEM,XRD}
}
@article{dassarma2005twodimensional,
title = {Two-{{Dimensional Metal-Insulator Transition}} as a {{Percolation Transition}} in a {{High-Mobility Electron System}}},
author = {Das Sarma, S. and Lilly, M. P. and Hwang, E. H. and Pfeiffer, L. N. and West, K. W. and Reno, J. L.},
year = {2005},
month = apr,
journal = {Physical Review Letters},
volume = {94},
number = {13},
pages = {136401},
publisher = {{American Physical Society}},
doi = {10.1103/PhysRevLett.94.136401},
abstract = {By carefully analyzing the low temperature density dependence of 2D conductivity in undoped high-mobility n-GaAs heterostructures, we conclude that the 2D metal-insulator transition in this 2D electron system is a density inhomogeneity driven percolation transition due to the breakdown of screening in the random charged impurity disorder background. In particular, our measured conductivity exponent of {$\sim$}1.4 approaches the 2D percolation exponent value of 4/3 at low temperatures and our experimental data are inconsistent with there being a zero-temperature quantum critical point in our system.}
}
@article{datye2018reduction,
title = {Reduction of Hysteresis in {{MoS}}{\textsubscript{2}} Transistors Using Pulsed Voltage Measurements},
author = {Datye, Isha M. and Gabourie, Alexander J. and English, Chris D. and Smithe, Kirby K. H. and McClellan, Connor J. and Wang, Ning C. and Pop, Eric},
year = {2018},
month = oct,
journal = {2D Materials},
volume = {6},